Blaschkolinear dermatosis: A fascinating dermatological pattern
DOI:
https://doi.org/10.66344/jpad.15.4.2005.661References
Jackson R. The lines of Blaschko: a review and reconsideration: Observations of the cause of certain unusual linear conditions of the skin. Br J Dermatol 1976; 95: 349-60.
Bolognia JL, Orlow SJ, Glick SA. Lines of Blaschko. J Am Acad Dermatol 1994; 31: 157-90.
Blaschko A. Die Nervenverteilung in der Haut in ihrer Beziehung zu den Erkrankungen der Haut.. Vienna, Austria: Wilhelm Braunmuller; 1901.
Happle R. Mosaicism in human skin. Understanding the patterns and mechanisms. Arch Dermatol 1993. 129: 1460-70.
Happle R. Patterns on the skin. New aspects of their embryologic and genetic causes. Hautarzt 2004; 55: 960-1, 964-8.
Tagra S, Talwar AK, Walia RS. Lines of Blaschko. Indian J Dermatol Venereol Leprol 2005; 71: 57-9.
Bari AU, Rahman SB. Naevoid psoriasis: An uncommon blaschkolinear dermatosis. J Pak Assoc Dermatol 2004; 14: 156-9.
Bari AU, Rahman SB. Zosteriform lichen planus. J Coll Physicians Surg Pak 2003; 13: 104-5.
Grosshans E, Marot L. Blaschkitis in adults. Ann Dermatol Venereol 1990; 117: 9-15.
Bari AU, Rahman SB. Zosteriform lichen planus: A new variant of a common disorder. J Pak Assoc Dermatol 2004; 14: 5-9.
Downloads
Published
How to Cite
Issue
Section
License
Submission declaration
Authors retain the copyright to their work and grant the 'Journal of Pakistan Association of Dermatologists (JPAD)' the right of first publication under a Creative Commons Attribution 4.0 International (CC BY 4.0) license. This license allows others to share, adapt, and reuse the work for any purpose, including commercial use, as long as appropriate credit is given to the original authors and the journal.
By submitting a manuscript, authors confirm that the work has not been published previously (except as an abstract, lecture, or academic thesis), is not under review elsewhere, and has been approved by all authors and relevant authorities. Once accepted, the article will be openly accessible under the CC BY 4.0 license, ensuring wide dissemination and reuse with proper attribution.
